[43] A nonvolatile memory device made of a ferroelectric polymer gate nanodot and a single-walled carbon nanotube

ACS Nano 4 (12), 7315-7320 (2010)

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  • First authors: Jong Yeog Son
  • Corresponding authors: Hyun Myung Jang, Young-Han Shin
  • Whole authors: Jong Yeog Son, Sangwoo Ryu, Yoon-Cheol Park, Yun-Tak Lim, Yun-Sok Shin, Young-Han Shin, Hyun Myung Jang
  • Authors from M3L: Young-Han Shin
We demonstrate a field-effect nonvolatile memory device made of a ferroelectric copolymer gate nanodot and a single-walled carbon nanotube (SW-CNT). A position-controlled dip-pen nanolithography was performed to deposit a poly(vinylidene fluoride-ran-trifluoroethylene) (PVDF-TrFE) nanodot onto the SW-CNT channel with both a source and drain for field-effect transistor (FET) function. PVDF-TrFE was chosen as a gate dielectric nanodot in order to efficiently exploit its bipolar chemical nature. A piezoelectric force microscopy study confirmed the canonical ferroelectric responses of the PVDF-TrFE nanodot fabricated at the center of the SW-CNT channel. The two distinct ferroelectric polarization states with the stable current retention and fatigue-resistant characteristics make the present PVDF-TrFE-based FET suitable for nonvolatile memory applications.

Authors from M3L

Author from M3L
Young-Han Shin
hoponpop@ulsan.ac.kr