[52] Nanoscale resistive random access memory consisting of a NiO nanodot and Au nanowires formed by dip-pen nanolithography

Applied Surface Science 257 (23), 9885-9887 (2011)

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  • First authors: Jong Yeog Son
  • Corresponding authors: Young-Han Shin, Yun-Sok Shin
  • Whole authors: Jong Yeog Son, Yun-Sok Shin, Young-Han Shin
  • Authors from M3L: Young-Han Shin
We demonstrate the nanoscale resistive random access memory (RRAM) element consisting of an approximately 30 nm diameter NiO nanodot and two bridging Au nanowires, formed by a dip-pen nanolithography technique using nickel carbonate (Ni2(CO3)(OH)2) and [AuCl4]− complex solutions, respectively. The Au/NiO/Au nanowire resistive switch exhibits typical unipolar switching characteristics with high performance at low Set and Reset voltages.

Authors from M3L

Author from M3L
Young-Han Shin
hoponpop@ulsan.ac.kr